Global Leader in ALD Technology
< Lucida M300PL ALD >
NCD has recently supplied 2 Lucida M300PL ALD systems to KANC. Lucida M300PL-O is the equipment for oxide deposition with Ozone and Plasma process, and Lucida M300PL-M is that for metal deposition with Plasma process.
These wafer process equipment have the specification below.
1) System: Lucida M300PL-O, Lucida M300PL-M
2) Substrate: Wafer 300mm
3) Deposition Materials:
- Lucida M300PL-O: Al2O3, TiO2, ZrO2, ZnO, HfO2, Ta2O5...
- Lucida M300PL-M: Co. Ru, W, Ir, TiN, TaN...
KANC, which is the most prestigious institute of Korea on nanotechnology, is using Lucida M300PL to investigate cutting edge semiconductor development and promising applications in MEMS and IoT. So it will be expected that these systems will contribute very much to the development of high-end nanotechnology.
NCD will do best to be the best ALD equipment company with continuous R&D efforts.