Global Leader in ALD Technology
<Lucida M200PL Series ALD System>
NCD has recently supplied ASD (Area Selective Deposition) equipment to Samsung Electronics Co., Ltd. Following ALE (Atomic Layer Etching).
This is the cluster system which consist of two process modules (PMs) and a wafer transfer module (TM), and applies running program for process integration. Also it is special equipment to process at high temperature up to 500℃ and process with ozone and plasma for developing next semiconductor devices.
ALE is able to etch a deposited layer by atomic scale as opposed to ALD and ASD can only deposit on the selective area not to grow the whole area of substrates by ALD.
Today, lots of universities, institutes and companies have actively been developing future high-tech and high integrated devices using ALE and ASD processes.
NCD expects that the ALE/ASD system will contribute very much to the development of high end semiconductor technology and is going to do all of the efforts to the best ALD equipment company with new challenges and continuous R&D.