Global Leader in ALD Technology
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- Lucida™ GuD Series ALD
LucidaTM GuD Series ALD
High throughput atomic layer deposition system for OLED displays
Process module for LucidaTM GuD series
Applications
- Barrier layer(Al2O3) for Si-wafer substrate
- WVTR(water vapor transmission rate) of <5.0x10-4 g/m2
- Encapsulation layer(Al2O3) for Micro-OLED
- Applications of mass-product
Benefits
- High throughput :>10 wafer/hour (Ref.: 30k/month, Tact Time: 1min @50nm)
- Substrate size :≤12 inch
Features
- Advanced process kit and small volume chamber for short gas cycle times
- Extremely materialized ALD mechanism
- Small foot print
- Totally integrated process module
- Easy process control
Technical Specifications
| Model | Material | Wafer Size (inch) | Thickness (nm) | Throughput (panel/hour) |
|---|---|---|---|---|
| LucidaTM GuD200-C | Al2O3 | 8 | 30 | >10@LL + 5ALD + UL |
| LucidaTMGuD300-C | Al2O3 | 12 | 30 | >10@LL + 5ALD + UL |