High throughput atomic layer deposition system for
OLED displays |
Applications |
- Barrier layer(Al2O3, TiO2) for flexible substrate
- WVTR(water vapor transmission rate) 5.3x10-5g/m2·day
(tritiated water test @30nm Al2O3/PEN substrate)
- Encapsulation layer(Al2O3,TiO2) for OLED
- Applications of mass-product
|
Benefits |
- High throughput : > 30 panels/hour
- Substrate size : > 6G (1500 x 1850mm2)
|
Features |
- Advanced process kit and small volume chamber
for short gas cycle times
- Extremely materialize ALD mechanism
- Small foot print
- Totally integrated process module
- Easy process control
|
Technical specifications |
Model |
Material |
Panel size
(mm2) |
Thickness
(nm) |
Throughput
(panel/hour) |
Lucida™ GD250 |
Al2O3,TiO2 |
370x470 |
30 |
>30 |
Lucida™ GD450H |
Al2O3,TiO2 |
730x460 |
30 |
>30 |
Lucida™ GD450 |
Al2O3,TiO2 |
730x920 |
30 |
>30 |
Lucida™ GD550Q |
Al2O3,TiO2 |
650x750 |
30 |
>30 |
Lucida™ GD600H |
Al2O3,TiO2 |
1500x925 |
30 |
>30 |
Lucida™ GD600 |
Al2O3,TiO2 |
1500x1850 |
30 |
>30 |
|
|
Process module for Lucida™ GD series
Cluster system for Lucida™ GD series
Demo version of Lucida™ GD600 |