TECHNOLOGIESTechnology reports
Technology reports
IMID 2015 DIGEST, Oxide Thin-Film Transistors Using In-Ga-Zn-O Active Channels Prepared by Atomic Layer Deposition (149 KB PDF)
J. Vac. Sci. Technol. A 34(1), 01A144-1~7, Jan Feb 2016, Thickness-dependent growth orientation of F-doped ZnO films formed by atomic layer deposition (0 KB PDF)
IEEE SENSORS JOURNAL, 2015, Fabrication of Au-Decorated 3D ZnO Nanostructures as Recyclable SERS Substrates (0 KB PDF)
CERAMICS INTERNAIONAL-2014-1-s2.0-S0272884214015181-main, The growth behavior and properties of atomic layer deposited zinc oxide films usinghydrogenperoxide(H2O2) andozone(O3) oxidants (0 KB PDF)
Bull. Korean Chem. Soc. 2014-B140204_353, Enhanced Stability of Organic Photovoltaics by Additional ZnO Layers on Rippled ZnO Electron-collecting Layer using Atomic Layer Deposition (0 KB PDF)
J. Mater. Sci. Technol., 2014, Surface Passivation Performance of Atomic-Layer-Deposited Al2O3 on p-type Silicon Substrates (0 KB PDF)
The Journal of physical chemistry-20140413110509_Ultrasmooth, High Electron Mobility Amorphous In−Zn−O Films Grown by Atomic Layer Deposition (0 KB PDF)
Applied Surface Science 285P (2013) 373–379, Controlled growth and properties of p-type cuprous oxide films byplasma-enhanced atomic layer deposition at low temperature (0 KB PDF)
J. Vac. Sci. Technol. A 31(1), JanFeb 2013, Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition (0 KB PDF)
Phys. Status Solidi RRL 6, No. 5, 196–198 (2012), Organic photovoltaics with high stability sustained for 100 days without encapsulation fabricated using atomic layer deposition (0 KB PDF)
J. Phys. Chem. C 2012, 116, 23231−23235, Efficient Hydrogenated Amorphous Silicon Thin-Film Solar Cells Using Zinc Oxide Deposited by Atomic Layer Deposition as a Protective Interfacial Layer (0 KB PDF)
J. Mater. Chem., 2012, 22, 24618, Alumina-coated silicon-based nanowire arrays for high quality Li-ion battery anodes (0 KB PDF)
Current Applied Physics, 2012, The impact on in-situ-hydrogen-plasma treatment for zinc oxide plasma enhanced atomic layer deposition (0 KB PDF)
KEEE_DHJGII_2010_v59n8_1401, Properties of HfO2 Insulating Film Using the ALD Method for Nonvolatile Memory Application (2 MB pdf)
Journal of Information Display, Vol. 11, No. 2, June 2010, Dependence of Dielectric Layer and Electrolyte on the Driving Performance of Electrowetting-Based Liquid Lens (0 KB pdf)
Electrochemical and Solid-State Letters-2009-12, Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O2 (540 KB pdf)