PRODUCTSSolar cellLucida™ GS Series ALD
Lucida™ GS Series ALD
High throughput atomic layer deposition system for
surface passivation of c-Si solar cells
  • Al2O3 surface passivation of c-silicon solar cells
  • Applications of mass-production
  • Industrial fully-automated production equipment
  • High throughput : up to 3400 wafers/hour of 156 x 156㎟
  • Al2O3 thin films with good thickness uniformity
  • Advanced process kit and small volume chamber for short gas cycle times
  • Extremely materialize ALD mechanism
  • Small foot print
  • Totally integrated process module
  • Easy process control
  • Automatic cassette to cassette operation
Technical specifications
Model Material Wafer size
Lucida™ GS800 Al2O3 156x156 10 >1700
Lucida™ GS1200 Al2O3 156x156 10 >2400
Lucida™ GS1600 Al2O3 156x156 10 >3400

Lucida™ GS series

Lucida™ GS series + Automation
More information for application and specification for Lucida™ GS series