High throughput atomic layer deposition system for
surface passivation of c-Si solar cells |
Applications |
- Al2O3 surface passivation of c-silicon solar cells
- Applications of mass-production
- Industrial fully-automated production equipment
- High throughput : up to 3400 wafers/hour of 156 x 156㎟
|
Features |
- Al2O3 thin films with good thickness uniformity
- Advanced process kit and small volume chamber for short gas cycle times
- Extremely materialize ALD mechanism
- Small foot print
- Totally integrated process module
- Easy process control
- Automatic cassette to cassette operation
|
Technical specifications |
Model |
Material |
Wafer size
(mm2) |
Thickness
(nm) |
Throughput
(wph) |
Lucida™ GS800 |
Al2O3 |
156x156 |
10 |
>1700 |
Lucida™ GS1200 |
Al2O3 |
156x156 |
10 |
>2400 |
Lucida™ GS1600 |
Al2O3 |
156x156 |
10 |
>3400 |
|