Global Leader in ALD Technology
High throughput atomic layer deposition system for surface passivation of c-Si solar cells
LucidaTM GS Series
LucidaTM GS Series + Automation
Applications
Features
Technical Specifications
Model | Material | Wafer Size(mm2) | Thickness (nm) | Throughput(wph) |
---|---|---|---|---|
LucidaTM GS200 | Al2O3 | 156x156 | 4 | ≥550 |
LucidaTM GS800 | Al2O3 | 156x156 | 4 | ≥2300 |
LucidaTM GS1200 | Al2O3 | 156x156 | 4 | ≥3400 |
LucidaTM GS1600 | Al2O3 | 156x156 | 4 | ≥4500 |
LucidaTM GS6000 | Al2O3 | 156x156 | 4 | ≥6000 |