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So-Yeong Naa and Sung-Min Yoon, Reliability enhancement in thin film transistors using Hf and Al co-incorporated ZnO active channels deposited by atomic-layer-deposition, RSC Adv., 2018,8, 34215-34223
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Kyung-Mun Kang, Yong-June Choi, Geun Young Yeom, and Hyung-Ho Park, Thickness-dependent growth orientation of F-doped ZnO films formed by atomic layer deposition, Journal of Vacuum Science & Technology A 34, 01A144 (2016)
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Sung-Gyu Park et al., Fabrication of Au-Decorated 3D ZnO Nanostructures as Recyclable SERS Substrates, SENSORS, 2014 IEEE, 2-5 Nov. 2014, 1930-0395
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J. Park et al., The growth behavior and properties of atomic layer deposited zinc oxide films using hydrogen peroxide (H2O2) and ozone (O3) oxidants, Ceramics International Volume 41, Issue 1, Part B, January 2015, Pages 1839-1845
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Kwang-Dae Kim et al., Enhanced Stability of Organic Photovoltaics by Additional ZnO Layers on Rippled ZnO Electron-collecting Layer using Atomic Layer Deposition, Bull. Korean Chem. Soc. 2014, Vol. 35, No. 2 353
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Yanghui Liu, Liqiang Zhu, Liqiang Guo, Hongliang Zhang, Hui Xiao, Surface Passivation Performance of Atomic-Layer-Deposited Al2O3 on p-type Silicon Substrates, J. Mater. Sci. Technol., 2014, 30(8), 835-838
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Do-Joong Lee et al., Ultrasmooth, High Electron Mobility Amorphous In−Zn−O Films Grown by Atomic Layer Deposition, J. Phys. Chem. C 2014, 118, 408−415
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Tae-Hoon Jung et al., Controlled growth and properties of p-type cuprous oxide films byplasma-enhanced atomic layer deposition at low temperature, Applied Surface Science 285P (2013) 373–379
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J. Vac. Sci. Technol. A 31(1), JanFeb 2013, Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
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Sun-Young Park et al., Organic photovoltaics with high stability sustained for 100 days without encapsulation fabricated using atomic layer deposition, Phys. Status Solidi RRL 6, No. 5, 196–198 (2012)
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