Global Leader in ALD Technology
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- Solar Cell
- Lucida™ GS Series ALD
LucidaTM GS Series ALD
High throughput atomic layer deposition system for surface passivation of c-Si solar cells
LucidaTM GS Series
LucidaTM GS Series + Automation
LucidaTM GS 200
Applications
- Al2O3 surface passivation of c-silicon solar cells
- Applications of mass-production
- Industrial fully-automated production equipment
- High throughput : up to 4500 wafers/hour of 156 x 156mm2
Features
- Al2O3 thin films with good thickness uniformity
- Advanced process kit and small volume chamber for short gas cycle times
- Extremely materialized ALD mechanism
- Small foot print
- Totally integrated process module
- Easy process control
- Automatic cassette to cassette operation
Technical Specifications
| Model | Material | Wafer Size(mm2) | Thickness (nm) | Throughput (wph) |
|---|---|---|---|---|
| LucidaTMGS200 | Al2O3 | 156x156 | 4 | ≥550 |
| LucidaTMGS800 | Al2O3 | 156x156 | 4 | ≥2300 |
| LucidaTMGS1200 | Al2O3 | 156x156 | 4 | ≥3400 |
| LucidaTMGS1600 | Al2O3 | 156x156 | 4 | ≥4500 |
| LucidaTM GS6000 | Al2O3 | 156x156 | 4 | ≥6000 |