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LucidaTM GS Series ALD

High throughput atomic layer deposition system for surface passivation of c-Si solar cells

LucidaTM GS Series

Lucida GS Series

LucidaTM GS Series + Automation

Lucida GS Series automation

LucidaTM GS 200

Lucida GS Series automation

Applications

  • Al2O3 surface passivation of c-silicon solar cells
  • Applications of mass-production
  • Industrial fully-automated production equipment
  • High throughput : up to 4500 wafers/hour of 156 x 156mm2

Features

  • Al2O3 thin films with good thickness uniformity
  • Advanced process kit and small volume chamber for short gas cycle times
  • Extremely materialized ALD mechanism
  • Small foot print
  • Totally integrated process module
  • Easy process control
  • Automatic cassette to cassette operation

Technical Specifications

Technical Specifications
Model Meterial Wafer Size(mm2) Thickness (nm) Throughtput (wph)
LucidaTM GS200 Al2O3 156x156 4 ≥ 550
LucidaTM GS800 Al2O3 156x156 4 ≥ 2300
LucidaTM GS1200 Al2O3 156x156 4 ≥ 3400
LucidaTM GS1600 Al2O3 156x156 4 ≥ 4500
More information for application and specification for Lucida™ GS series