Global Leader in ALD Technology

  • 메인
  • PRODUCTS
  • Display
  • Lucida™ GuD Series ALD

LucidaTM GuD Series ALD

High throughput atomic layer deposition system for OLED displays

Process module for LucidaTM GuD series

Lucida GuD Series

Applications

  • Barrier layer(Al2O3) for Si-wafer substrate
  • WVTR(water vapor transmission rate) of < 5.0x10-4 g/m2
  • Encapsulation layer(Al2O3) for Micro-OLED
  • Applications of mass-product

Benefits

  • High throughput : > 10 wafer/hour (Ref.: 30k/month, Tact Time: 1min @50nm)
  • Substrate size : ≤ 12 inch

Features

  • Advanced process kit and small volume chamber for short gas cycle times
  • Extremely materialized ALD mechanism
  • Small foot print
  • Totally integrated process module
  • Easy process control

Technical Specifications

Technical Specifications
Model Meterial Wafer Size (inch) Thickness (nm) Throughtput (panel/hour)
LucidaTM GuD200-C Al2O3 8 30 >10@LL + 5ALD + UL
LucidaTMGuD300-C Al2O3 12 30 >10@LL + 5ALD + UL