Global Leader in ALD Technology
- PRODUCTS
- Display
- Lucida™ GuD Series ALD
LucidaTM GuD Series ALD
High throughput atomic layer deposition system for OLED displays
- Barrier layer(Al2O3) for Si-wafer substrate
- WVTR(water vapor transmission rate) of < 5.0x10-4 g/m2
- Encapsulation layer(Al2O3) for Micro-OLED
- Applications of mass-product
- High throughput : > 10 wafer/hour (Ref.: 30k/month, Tact Time: 1min @50nm)
- Substrate size : ≤ 12 inch
- Advanced process kit and small volume chamber for short gas cycle times
- Extremely materialized ALD mechanism
- Small foot print
- Totally integrated process module
- Easy process control
Technical Specifications
Model |
Material |
Wafer Size (inch) |
Thickness (nm) |
Throughput(panel/hour) |
LucidaTM GuD200-C |
Al2O3 |
8 |
30 |
>10@LL + 5ALD + UL |
LucidaTMGuD300-C |
Al2O3 |
12 |
30 |
>10@LL + 5ALD + UL |