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- Lucida™ GD Series ALD
LucidaTM GD Series ALD
High throughput atomic layer deposition system for OLED displays
Process module for LucidaTM GD series
Cluster system for LucidaTM GD series
Demo version of LucidaTM GD600
Applications
- Barrier layer(Al2O3) for flexible substrate
- WVTR(water vapor transmission rate) of < 5.0x10-4 g/m2·day (tritiated water test @30nm Al2O3/PEN substrate)
- Encapsulation layer(Al2O3) for OLED
- Applications of mass-product
Benefits
- High throughput : > 30 panels/hour
- Substrate size : ≤ 6G (1500 x 1850mm2)
Features
- Advanced process kit and small volume chamber for short gas cycle times
- Extremely materialized ALD mechanism
- Small foot print
- Totally integrated process module
- Easy process control
Technical Specifications
| Model | Material | Panel Size (mm2) | Thickness (nm) | Throughput(panel/hour) |
|---|---|---|---|---|
| LucidaTM GD250 | Al2O3 | 370x470 | 30 | >30@LL + 3ALD + UL |
| LucidaTMGD450H | Al2O3 | 730x460 | 30 | >30@LL + 3ALD + UL |
| LucidaTM GD450 | Al2O3 | 730x920 | 30 | >30@LL + 3ALD + UL |
| LucidaTM GD550Q | Al2O3 | 650x750 | 30 | >30@LL + 3ALD + UL |
| LucidaTMGD600H | Al2O3 | 1500x925 | 30 | >30@LL + 3ALD + UL |
| LucidaTMGD600 | Al2O3 | 1500x1850 | 30 | >30@LL + 5ALD + UL |