PRODUCTSSemiconductorLucida™ S series ALD
Lucida™ S series ALD
New concept high throughput ALD system
  • Ultra thin films for semiconductor applications
    : Al2O3, HfO2, ZrO2, TiO2, SrTiO3 ……
  • 300mm wafers
  • Applications for high throughput
  • ALD ultra-thin film with good thickness uniformity and
    conformal step coverage
  • Advanced ALD process kit
  • Extremely materialize ALD mechanism
  • Small foot print
  • Totally integrated process module
More information for application and specification for Lucida™ S series